The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2014

Filed:

Nov. 15, 2005
Applicants:

Eui-gyu Kim, Suwon-si, KR;

Tae-hyung Kim, Suwon-si, KR;

Inventors:

Eui-Gyu Kim, Suwon-si, KR;

Tae-Hyung Kim, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/00 (2006.01); B08B 7/04 (2006.01); B08B 3/00 (2006.01); B08B 3/04 (2006.01); B08B 3/12 (2006.01);
U.S. Cl.
CPC ...
B08B 7/0042 (2013.01); B08B 3/04 (2013.01); B08B 2209/005 (2013.01); B08B 3/12 (2013.01); Y10S 134/902 (2013.01);
Abstract

Provided is a method of descaling a mask that quickly and effectively removes a material attached to the mask. The method includes: directing a laser beam onto a material attached to the mask; and removing the material attached to the mask.


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