The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2014
Filed:
Oct. 29, 2010
James P. Cruse, Santa Cruz, CA (US);
John W. Lane, San Jose, CA (US);
Mariusch Gregor, San Jose, CA (US);
Duc Buckius, San Jose, CA (US);
Berrin Daran, Bruddock, CT (US);
Corie Lynn Cobb, Mountain View, CA (US);
Ming Xu, San Jose, CA (US);
Andrew Nguyen, San Jose, CA (US);
James P. Cruse, Santa Cruz, CA (US);
John W. Lane, San Jose, CA (US);
Mariusch Gregor, San Jose, CA (US);
Duc Buckius, San Jose, CA (US);
Berrin Daran, Bruddock, CT (US);
Corie Lynn Cobb, Mountain View, CA (US);
Ming Xu, San Jose, CA (US);
Andrew Nguyen, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods and apparatus for calibrating a plurality of gas flows in a substrate processing system are provided herein. In some embodiments, a substrate processing system may include a cluster tool comprising a first process chamber and a second process chamber coupled to a central vacuum transfer chamber; a first flow controller to provide a process gas to the first process chamber; a second flow controller to provide the process gas to the second process chamber; a mass flow verifier to verify a flow rate from each of the first and second flow controllers; a first conduit to selectively couple the first flow controller to the mass flow verifier; and a second conduit to selectively couple the second flow controller to the mass flow verifier.