The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 22, 2014

Filed:

Dec. 23, 2011
Applicants:

Peter A. Robinson, Enoggera Reservoir, AU;

Stefan Pingel, Everton Hills, AU;

Jaimee Brown, Fortitude Valley, AU;

Geetu Preet Sandhu, Wollstonecraft, AU;

Inventors:

Peter A. Robinson, Enoggera Reservoir, AU;

Stefan Pingel, Everton Hills, AU;

Jaimee Brown, Fortitude Valley, AU;

Geetu Preet Sandhu, Wollstonecraft, AU;

Assignee:

EMC Corporation, Hopkinton, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 11/30 (2006.01); G06F 21/51 (2013.01);
U.S. Cl.
CPC ...
G06F 21/51 (2013.01);
Abstract

A method of running an application in a process virtual machine (PVM) on a computing device using a dynamically-linked module (DLM) with an integrity self-check feature is provided. The DLM is written in PVM-native bytecode, and the PVM is configured to execute applications stored as PVM-native bytecode within a single code file associated with that application. The method includes (a) dynamically linking the application to the DLM by loading the PVM-native bytecode of the DLM from a resource file separate from the single code file of the application, (b) performing the integrity self-check feature on the DLM to ensure the integrity of the PVM-native bytecode of the DLM, and (c) in response to the DLM passing the integrity self-check, calling functions of the DLM from within the application. Embodiments directed to analogous computer program products and apparatuses are also provided.


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