The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
Feb. 21, 2012
Chie Fukuda, Yokohama, JP;
Chie Fukuda, Yokohama, JP;
Sumitomo Electric Industries, Ltd., Osaka, JP;
Abstract
A method for making a polarization rotator includes the steps of forming a structure including a semiconductor substrate and a mesa part, forming a first semiconductor layer on a main surface of the semiconductor substrate and around the mesa part, forming a second semiconductor layer on the first semiconductor layer, forming a semiconductor laminate by forming a third semiconductor layer on the second semiconductor layer, forming a mask layer on the third semiconductor layer, forming a mesa including a first semiconductor core by etching the semiconductor laminate, and forming a first semiconductor cladding by forming a fourth semiconductor layer around the mesa. The first semiconductor core and the first semiconductor cladding form a polarization rotating unit. An inclined surface of a mesa-part-adjacent portion extends in a second direction forming an acute angle with the main surface. An inclined portion of the second semiconductor layer extends in the second direction.