The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
Apr. 02, 2010
Applicants:
Hiroyuki Nagasaka, Kumagaya, JP;
Takeshi Okuyama, Yokohama, JP;
Inventors:
Hiroyuki Nagasaka, Kumagaya, JP;
Takeshi Okuyama, Yokohama, JP;
Assignees:
Nikon Corporation, Tokyo, JP;
Nikon Engineering Co., Ltd., Yokohama-shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate. The apparatus includes a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts. The structure has an aperture to allow transmission of the pattern and a recess at the bottom side of the structure to extract a fluid from the space.