The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 22, 2014

Filed:

Oct. 23, 2008
Applicants:

Andrew Witkin, Oakland, CA (US);

Michael Kass, Berkeley, CA (US);

Hayley Iben, Union City, CA (US);

Inventors:

Andrew Witkin, Oakland, CA (US);

Michael Kass, Berkeley, CA (US);

Hayley Iben, Union City, CA (US);

Assignee:

Pixar, Emeryville, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 13/00 (2011.01); G06T 17/00 (2006.01); G06F 9/44 (2006.01); G03B 21/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

A model is associated with a deep pose. When the model is changed from an attractor pose to a current pose, the current pose and the attractor pose are compared with the deep pose. If any portion of the current pose is more similar to the deep pose than the attractor pose, then the attractor pose is updated. A portion of the attractor pose may be set to the corresponding portion of the current pose. The attractor pose may be modified by a function. Pose attributes of each pose degrees of freedom for the attractor pose, the current pose, and the deep pose may be evaluated to potentially modify all or a portion of the attractor pose. The attractor pose and pose constraints are used to determine a pose of the model, for example by an optimization process based on the attractor pose while satisfying pose constraints.


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