The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 22, 2014

Filed:

Jul. 15, 2009
Applicants:

Wieslaw J. Roth, Sewell, NJ (US);

Douglas L. Dorset, Milford, NJ (US);

Gordon J. Kennedy, Washington, NJ (US);

Thomas Yorke, Toms River, NJ (US);

Terry Eugene Helton, Bethlehem, PA (US);

Inventors:

Wieslaw J. Roth, Sewell, NJ (US);

Douglas L. Dorset, Milford, NJ (US);

Gordon J. Kennedy, Washington, NJ (US);

Thomas Yorke, Toms River, NJ (US);

Terry Eugene Helton, Bethlehem, PA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C 2/68 (2006.01);
U.S. Cl.
CPC ...
Abstract

This disclosure relates to an EMM-12 molecular sieve having, in its as-synthesized form and in calcined form, an X-ray diffraction pattern including peaks having a d-spacing maximum in the range of 14.17 to 12.57 Angstroms, a d-spacing maximum in the range of 12.1 to 12.56 Angstroms, and non-discrete scattering between about 8.85 to 11.05 Angstroms or exhibit a valley in between the peaks having a d-spacing maximum in the range of 10.14 to 12.0 Angstroms and a d-spacing maximum in the range from 8.66 to 10.13 Angstroms with measured intensity corrected for background at the lowest point being not less than 50% of the point at the same XRD d-spacing on the line connecting maxima in the range of 10.14 to 12.0 Angstroms and in the range from 8.66 to 10.13 Angstroms.


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