The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
Sep. 24, 2010
Norikazu Ito, Higashiomi, JP;
Shinichiro Inaba, Higashiomi, JP;
Hiroshi Matsui, Higashiomi, JP;
Koichiro Niira, Higashiomi, JP;
Norikazu Ito, Higashiomi, JP;
Shinichiro Inaba, Higashiomi, JP;
Hiroshi Matsui, Higashiomi, JP;
Koichiro Niira, Higashiomi, JP;
KYOCERA Corporation, Kyoto, JP;
Abstract
In order to form a high quality film without causing in-plane nonuniformity in film quality, an apparatus for forming deposited film according to an aspect of the present invention includes: a chamber; a first electrode located in the chamber; a second electrode that is located in the chamber with a predetermined spacing from the first electrode and includes a plurality of supply parts configured to supply material gases; an introduction path connected to the supply parts, through which the material gases are introduced; a heater located in the introduction path; and a cooling mechanism configured to cool the second electrode.