The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
Sep. 13, 2011
Da-ren Chiou, Taipei, TW;
Wei-che Hung, Taipei, TW;
Shoh-yue Lin, Taipei, TW;
Chiu-fang Chen, Taipei, TW;
Tzu-ying Chen, Taipei, TW;
Da-Ren Chiou, Taipei, TW;
Wei-Che Hung, Taipei, TW;
Shoh-Yue Lin, Taipei, TW;
Chiu-Fang Chen, Taipei, TW;
Tzu-Ying Chen, Taipei, TW;
Far Eastern New Century Corporation, Taipei, TW;
Abstract
A method for forming a microstructure includes: (a) forming a photocurable layer on a substrate, the photocurable layer including at least one photocurable compound that has a photocurable functional group equivalent weight ranging from 70 to 700 g/mol; (b) covering partially the photocurable layer using a patterned mask; (c) exposing the photocurable layer through the patterned mask using a first light source so that the photocurable layer is cured at first regions which are exposed; (d) removing the patterned mask; and (e) illuminating the photocurable layer using a second light source to cure second regions of the photocurable layer which have not been cured. The first and second regions have different surface heights and provide a surface roughness for the microstructure.