The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
Jun. 10, 2011
Jeong-oh Kim, Seoul, KR;
Jung-il Lee, Goyang-si, KR;
Kang-il Kim, Seoul, KR;
Jung-ho Bang, Paju-si, KR;
Jung-sun Beak, Paju-si, KR;
Jeong-Oh Kim, Seoul, KR;
Jung-Il Lee, Goyang-si, KR;
Kang-Il Kim, Seoul, KR;
Jung-Ho Bang, Paju-si, KR;
Jung-Sun Beak, Paju-si, KR;
LG Display Co., Ltd., Seoul, KR;
Abstract
The present disclosure is a method for forming a thin film pattern to form a micron-pattern and a flat display device having the same. The method for forming a thin film pattern includes the steps of forming first to third thin film layers on a substrate in succession, forming a first photoresist pattern on the third thin film layer, patterning the second and third thin film layers using the first photoresist pattern as a mask to form first and second thin film mask pattern having line widths different from each other, forming a second photoresist pattern at a region where the first and second thin film mask patterns do not overlap positioned between the first thin film layer and the second thin film mask pattern, removing the first and second thin film mask patterns, and patterning the first thin film layer using the second photoresist pattern as a mask.