The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
Jul. 31, 2008
Héctor Alejandro Becerril García, Palo Alto, CA (US);
Adam T. Woolley, Orem, UT (US);
Héctor Alejandro Becerril García, Palo Alto, CA (US);
Adam T. Woolley, Orem, UT (US);
Brigham Young University, Provo, UT (US);
Abstract
Nanostructures on substrates include one or more nanofeatures having unscathed walls and width dimensions of forty-five nm or less. The nanofeatures may include at least one of a nanotrench, nanocapillary, nano-chemical pattern, and nanowire. The nanostructures may include a nano object with a pattern of nano elements. A nano system may include at least one nano system device, which may include at least one nanofeature. A method of forming nanofeatures on substrates includes placing a nano-templating element on the substrate. A masking material is deposited at an acute angle to form shadow gaps on shadowed regions of the substrate. The nano-templating element, the angle, and other factors may be selected to form shadow gaps having width dimensions less than 10 nm. The substrate may be chemically modified in the areas corresponding to the shadow gaps to create nanofeatures with unscathed walls having width dimensions of less than 10 nm.