The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
Aug. 20, 2008
Paulus Petrus Maria Blom, Veldhoven, NL;
Philip Rosing, Eindhoven, NL;
Alquin Alphons Elisabeth Stevens, Eindhoven, NL;
Laurentia Johanna Huijbregts, Eindhoven, NL;
Eddy Bos, Eersel, NL;
Paulus Petrus Maria Blom, Veldhoven, NL;
Philip Rosing, Eindhoven, NL;
Alquin Alphons Elisabeth Stevens, Eindhoven, NL;
Laurentia Johanna Huijbregts, Eindhoven, NL;
Eddy Bos, Eersel, NL;
Vision Dynamics Holding B.V., AC Eindhoven, NL;
Abstract
Device for generating a plasma discharge for patterning the surface of a substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate, wherein the positioning means are arranged for selectively positioning the first electrode with respect to the second electrode in a first position in which a distance between the first discharge portion and the second discharge portion is sufficiently small to support the plasma discharge at the high voltage difference, and in a second position in which the distance between the first discharge portion and the second discharge portion is sufficiently large to prevent plasma discharge at the high voltage difference.