The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2014
Filed:
Mar. 15, 2013
Canon Kabushiki Kaisha, Tokyo, JP;
Tadashi Arai, Utsunomiya, JP;
Canon Kabushiki Kaisha, , JP;
Abstract
The present invention provides a decision method which decides a mask pattern used in an exposure apparatus comprising a projection optical system that projects a mask pattern including a main pattern and an auxiliary pattern onto a substrate, and an exposure condition in the exposure apparatus, the method including a step of calculating an image of a mask pattern formed on the substrate by the projection optical system while changing settings of the mask pattern and the exposure condition, and deciding the mask pattern and the exposure condition based on the image of the mask pattern, wherein the step includes determining whether or not to generate a new auxiliary pattern after the settings are changed.