The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2014
Filed:
Apr. 22, 2011
Sarbeswar Sahoo, Shakopee, MN (US);
Michael Christopher Kautzky, Eagan, MN (US);
Hui Tao Brickner, Savage, MN (US);
David Christopher Seets, Excelsior, MN (US);
Mark T. Kief, Lakeville, MN (US);
Sarbeswar Sahoo, Shakopee, MN (US);
Michael Christopher Kautzky, Eagan, MN (US);
Hui Tao Brickner, Savage, MN (US);
David Christopher Seets, Excelsior, MN (US);
Mark T. Kief, Lakeville, MN (US);
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
A first trench sidewall has a continuous first taper angle that terminates at a first plane. At least one layer may be deposited that forms a second trench sidewall with a continuous second taper angle that extends a predetermined depth past the first plane and is less than the first taper angle. A write pole may then be formed on the second trench sidewall with the write pole being closer to the first trench sidewall at the predetermined depth than at the first plane.