The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2014
Filed:
Jun. 07, 2011
Chun-wei Wu, New Taipei, TW;
Chun-Wei Wu, New Taipei, TW;
Nanya Technology Corp., Kueishan, Tao-Yuan Hsien, TW;
Abstract
A method for determining an illumination source with optimized depth of focus includes the following steps. First, a simulated optimal correlation and a simulated defocus correlation of each illumination source are provided. Second, an optimal peak is determined, a defocus peak is determined, and an optimal correlation slope and a defocus correlation slope are determined. An optimal correlation ratio and a peak variation are calculated. A correlation variation is calculated from the optimal correlation ratio and the defocus correlation ratio. Next, a weighted variation is determined from the peak variation and the correlation variation. An illumination source of a lowest weighted variation among a plurality of the illumination sources is determined to be an illumination source with optimized depth of focus.