The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2014
Filed:
Feb. 13, 2012
Liejia Qian, Shanghai, CN;
Yongzhi Wang, Shanghai, CN;
Peng Yuan, Shanghai, CN;
Jingui MA, Shanghai, CN;
Guoqiang Xie, Shanghai, CN;
Liejia Qian, Shanghai, CN;
Yongzhi Wang, Shanghai, CN;
Peng Yuan, Shanghai, CN;
Jingui Ma, Shanghai, CN;
Guoqiang Xie, Shanghai, CN;
Fudan University, Shanhgai, CN;
Abstract
A high-fidelity device for single-shot pulse contrast measurement based on quasi-phase-matching includes a generating unit of sampling pulse, a high-fidelity cross-correlation unit of nonlinear SFG and a high-sensitivity signal detecting unit. An innovatively designed dot-mirror or dot-attenuator and correlating crystal. The dot-mirror or dot-attenuator is adopted to suppress the scattering noise, which is mainly induced by air scattering of the main peak of the correlation beam, to a level below the real pulse background. While the crystal is introduced into the device as a nonlinear correlation crystal to move two kinds of artifacts introduced by a correlation process respectively out of the temporal window and behind the main pulse, so that effects of the artifacts on the contrast measurement in a pulse leading edge are removed, without obviously affecting other parameters. The device is also fit for measuring contrasts of high-power lasers of various wavelengths.