The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 15, 2014

Filed:

Jul. 25, 2011
Applicants:

David Weninger Barnes, Cambridge, MA (US);

Gregory Raymond Bebernitz, Cambridge, MA (US);

Kevin Clairmont, Cambridge, MA (US);

Scott Louis Cohen, Cambridge, MA (US);

Robert Edson Damon, Cambridge, MA (US);

Robert Francis Day, Cambridge, MA (US);

Stephanie Kay Dodd, Cambridge, MA (US);

Christoph Gaul, Basel, CH;

Hatice Belgin Gulgeze Efthymiou, Cambridge, MA (US);

Monish Jain, Cambridge, MA (US);

Rajeshri Ganesh Karki, Cambridge, MA (US);

Louise Clare Kirman, Cambridge, MA (US);

Kai Lin, Cambridge, MA (US);

Justin Yik Ching Mao, Cambridge, MA (US);

Tajesh Jayprakash Patel, Cambridge, MA (US);

Brian Kenneth Raymer, Cambridge, MA (US);

Liansheng Su, Cambridge, MA (US);

Inventors:

David Weninger Barnes, Cambridge, MA (US);

Gregory Raymond Bebernitz, Cambridge, MA (US);

Kevin Clairmont, Cambridge, MA (US);

Scott Louis Cohen, Cambridge, MA (US);

Robert Edson Damon, Cambridge, MA (US);

Robert Francis Day, Cambridge, MA (US);

Stephanie Kay Dodd, Cambridge, MA (US);

Christoph Gaul, Basel, CH;

Hatice Belgin Gulgeze Efthymiou, Cambridge, MA (US);

Monish Jain, Cambridge, MA (US);

Rajeshri Ganesh Karki, Cambridge, MA (US);

Louise Clare Kirman, Cambridge, MA (US);

Kai Lin, Cambridge, MA (US);

Justin Yik Ching Mao, Cambridge, MA (US);

Tajesh Jayprakash Patel, Cambridge, MA (US);

Brian Kenneth Raymer, Cambridge, MA (US);

Liansheng Su, Cambridge, MA (US);

Assignee:

Novartis AG, Basel, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D 215/00 (2006.01); C07D 235/04 (2006.01); A61K 31/4985 (2006.01); A61K 31/47 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides compounds of formula (I); or pharmaceutically acceptable salts thereof, wherein the variables are defined as herein. The present invention provides a method for manufacturing the compounds of formula (I), their therapeutic uses, combinations with other of pharmacologically active agents, and a pharmaceutical compositions.


Find Patent Forward Citations

Loading…