The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 15, 2014

Filed:

May. 20, 2011
Applicants:

Swarnal Borthakur, Boise, ID (US);

Kevin W. Hutto, Kuna, ID (US);

Andrew Perkins, Boise, ID (US);

Marc Sulfridge, Boise, ID (US);

Inventors:

Swarnal Borthakur, Boise, ID (US);

Kevin W. Hutto, Kuna, ID (US);

Andrew Perkins, Boise, ID (US);

Marc Sulfridge, Boise, ID (US);

Assignee:

Aptina Imaging Corporation, George Town, KY;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 31/0203 (2014.01); H01L 31/0224 (2006.01); H01L 27/146 (2006.01);
U.S. Cl.
CPC ...
H01L 31/0203 (2013.01); H01L 31/022408 (2013.01); H01L 27/14618 (2013.01);
Abstract

Methods for forming backside illuminated (BSI) image sensors having metal redistribution layers (RDL) and solder bumps for high performance connection to external circuitry are provided. In one embodiment, a BSI image sensor with RDL and solder bumps may be formed using a temporary carrier during manufacture that is removed prior to completion of the BSI image sensor. In another embodiment, a BSI image sensor with RDL and solder bumps may be formed using a permanent carrier during manufacture that partially remains in the completed BSI image sensor. A BSI image sensor may be formed before formation of a redistribution layer on the front side of the BSI image sensor. A redistribution layer may, alternatively, be formed on the front side of an image wafer before formation of BSI components such as microlenses and color filters on the back side of the image wafer.


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