The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8697332 B1

Date of Patent:

Apr. 15, 2014

Filed:

Mar. 26, 2010

Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same

Applicants:

Mami Katayama, Tokyo-to, JP;

Shunji Fukuda, Tokyo-to, JP;

Katsuya Sakayori, Tokyo-to, JP;

Kouji Kawaguchi, Tokyo-to, JP;

Inventors:

Mami Katayama, Tokyo-to, JP;

Shunji Fukuda, Tokyo-to, JP;

Katsuya Sakayori, Tokyo-to, JP;

Kouji Kawaguchi, Tokyo-to, JP;

Assignee:

Dai Nippon Printing Co., Ltd., Tokyo-to, JP;

Attorney:

Ladas & Parry LLP

Primary Examiner:

Sin J Lee

Int. Cl.

CPC ...

G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/38 (2006.01);

U.S. Cl.

CPC ...

Abstract

An object of the present invention is to provide a base generator which has sensitivity and is applicable to a wide range of applications, and a photosensitive resin composition which is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The base generator generates a base by exposure to electromagnetic radiation and heating. The photosensitive resin composition comprises a polymer precursor in which reaction into a final product is promoted by the base generator and a basic substance or by heating in the presence of a basic substance.

Find Patent Forward Citations

Katayama, Mami. (2014). Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same (U.S. Patent No. 8697332). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8697332

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