The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2014
Filed:
Feb. 04, 2010
Kohei Matsui, Tokyo, JP;
Yasuhiro Shibata, Tokyo, JP;
Ryosuke Yasui, Tokyo, JP;
Toppan Printing Co., Ltd., Tokyo, JP;
Abstract
An exposure method is provided, in which when exposure is performed using a photomask having a plurality of mask patterns, various mask patterns corresponding to various different color filters are exposed in different regions on a substrate, without moving the photomask to an irradiation area in an exposure device. A photomask, having a first mask pattern for exposing a portion of colored pixels constituting a first color filter and a second mask pattern for exposing a portion of colored pixels constituting a second color filter, is fixed with respect to a light source. A light beam from a light source is selectively directed to the first mask pattern while transferring the substrate, to continuously expose a resist in a first region, and the light beam from the light source is selectively directed to the second mask pattern while transferring the substrate, to continuously expose a resist in a second region.