The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2014
Filed:
Sep. 24, 2009
Georges Zagdoun, La Garenne Columbes, FR;
Bernard Nghiem, Arsy, FR;
Emmanuel Valentin, Le Plessis Trevise, FR;
Svetoslav Tchakarov, Sceaux, FR;
Georges Zagdoun, La Garenne Columbes, FR;
Bernard Nghiem, Arsy, FR;
Emmanuel Valentin, Le Plessis Trevise, FR;
Svetoslav Tchakarov, Sceaux, FR;
Saint-Gobain Glass France, Courbevoie, FR;
Abstract
A process for manufacturing a mask having submillimetric openings, in which: for a masking layer, a first solution of colloidal nanoparticles in a first solvent is deposited, the particles having a given glass transition temperature T, the drying of the masking layer, known as the first masking layer, is carried out at a temperature below said temperature Tuntil a mask having a two-dimensional network of substantially straight-edged submillimetric openings, that defines a mask zone known as a network mask zone is obtained, a solid mask zone is formed by a liquid deposition, on the face, of a second masking zone, the solid mask zone being adjacent to and in contact with the network mask zone, and/or at least one cover zone is formed, the cover zone being in contact with the network mask zone, and/or after the drying of the first masking layer, a filled mask zone is formed by filling, via a liquid route, openings of a portion of the network mask zone. The invention also relates to the mask and the electroconductive grid obtained.