The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2014
Filed:
Mar. 01, 2013
Reinhausen Plasma Gmbh, Regensburg, DE;
Andreas Albrecht, Regensburg, DE;
Eckart Theophile, Wenzenbach, DE;
Reinhausen Plasma GmbH, Regensburg, DE;
Abstract
The invention relates to a device and method for generating a barrier discharge in a gas flow, comprising a reactor chamber permeable by the gas from an inflow side to an outflow side, a first electrode, a dielectric that shields the reactor chamber against the first electrode, and a second electrode, wherein the second and the first electrode can be switched to connect to a voltage source. To briefly expose a greater portion, preferably all, of the gas flow through the reactor chamber to a plasma, at least two discharge elements associated with the first electrode and made of electrically conductive material protrude at least partially into the reactor chamber and are electrically insulated from each other and the first and second electrodes, and the second electrode is disposed relative to the discharge elements such that discharges occur between the discharge elements and the second electrode in the reactor chamber.