The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2014
Filed:
Oct. 15, 2012
Applicant:
Rave, Llc, Delray Beach, FL (US);
Inventors:
Tod Evan Robinson, Boynton Beach, FL (US);
Bernabe J. Arruza, Boca Raton, FL (US);
Kenneth Gilbert Roessler, Boca Raton, FL (US);
Assignee:
Rave LLC, Delray Beach, FL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/00 (2006.01); B08B 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A system for removing debris from a surface of a photolithographic mask is provided. The system includes an atomic force microscope with a tip supported by a cantilever. The tip includes a surface and a nanometer-scaled coating disposed thereon. The coating has a surface energy lower than the surface energy of the photolithographic mask.
Quick Actions:
Robinson, Tod. (2014). Debris removal in high aspect structures (U.S. Patent No. 8696818). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8696818
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile