The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2014
Filed:
Jan. 27, 2012
Marc A. Unger, South San Francisco, CA (US);
Hou-pu Chou, Pasadena, CA (US);
Todd A. Thorsen, Pasadena, CA (US);
Axel Scherer, Laguna Beach, CA (US);
Stephen R. Quake, San Marino, CA (US);
Marc A. Unger, South San Francisco, CA (US);
Hou-Pu Chou, Pasadena, CA (US);
Todd A. Thorsen, Pasadena, CA (US);
Axel Scherer, Laguna Beach, CA (US);
Stephen R. Quake, San Marino, CA (US);
California Institute of Technology, Pasadena, CA (US);
Abstract
A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer; bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.