The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2014
Filed:
Dec. 23, 2011
Osamu Tsuboi, Kawasaki, JP;
Satoshi Ueda, Kawasaki, JP;
Yoshihiro Mizuno, Kawasaki, JP;
Ippei Sawaki, Kawasaki, JP;
Fumio Yamagishi, Kawasaki, JP;
Osamu Tsuboi, Kawasaki, JP;
Satoshi Ueda, Kawasaki, JP;
Yoshihiro Mizuno, Kawasaki, JP;
Ippei Sawaki, Kawasaki, JP;
Fumio Yamagishi, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.