The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2014
Filed:
May. 31, 2011
Mark A. Johnson, Hickman, NE (US);
Andrew S. Parr, Lincoln, NE (US);
Robert D. Eckles, Malcolm, NE (US);
Mark A. Johnson, Hickman, NE (US);
Andrew S. Parr, Lincoln, NE (US);
Robert D. Eckles, Malcolm, NE (US);
Li-Cor, Inc., Lincoln, NE (US);
Abstract
System flow path designs that minimize the impact of gas diffusion sources and sinks. By reducing the magnitude of parasitic sources and sinks, lower rates of photosynthesis and transpiration can be more accurately measured, e.g., without the need for extensive empirical compensation. The gas exchange analysis system includes a sample chamber having an inlet and an outlet, wherein the internal surface(s) of the chamber defining the measurement volume are metal plated. The system also typically includes a source of gas coupled with the inlet of the sample chamber, and a gas analyzer coupled with the outlet of the sample chamber and configured to measure a concentration of one or more gases exiting the chamber, whereby the metal plated internal surface(s) of the chamber reduces sorption of the one or more gases within the chamber.