The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2014
Filed:
Mar. 22, 2012
Asako Hirai, Santa Barbara, CA (US);
Zhongyuan Jia, Goleta, CA (US);
Makoto Saito, Ibaraki, JP;
Hisashi Yamada, Ibaraki, JP;
Kenji Iso, Kanagawa, JP;
Steven P. Denbaars, Goleta, CA (US);
Shuji Nakamura, Santa Barbara, CA (US);
James S. Speck, Goleta, CA (US);
Asako Hirai, Santa Barbara, CA (US);
Zhongyuan Jia, Goleta, CA (US);
Makoto Saito, Ibaraki, JP;
Hisashi Yamada, Ibaraki, JP;
Kenji Iso, Kanagawa, JP;
Steven P. Denbaars, Goleta, CA (US);
Shuji Nakamura, Santa Barbara, CA (US);
James S. Speck, Goleta, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
A nonpolar III-nitride film grown on a miscut angle of a substrate, in order to suppress the surface undulations, is provided. The surface morphology of the film is improved with a miscut angle towards an α-axis direction comprising a 0.15° or greater miscut angle towards the α-axis direction and a less than 30° miscut angle towards the α-axis direction.