The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2014
Filed:
Jul. 13, 2010
Ludwig Brehm, Adelsdorf, DE;
Rene Staub, Hagendorn/Schweiz, CH;
Ludwig Brehm, Adelsdorf, DE;
Rene Staub, Hagendorn/Schweiz, CH;
Leonhard Kurz & Stiftung & Co. KG, Furth, DE;
Abstract
The invention relates to a method for producing a multilayer element (), and also to a multilayer element () produced by said method. On and/or in a carrier ply () a decorative ply () is formed. The decorative ply () has a first region () and a second region (). Viewed perpendicular to the plane of the carrier ply (), the decorative ply () has in the first region () a first transmittance and in the second region () a second transmittance greater in comparison to the first transmittance. A layer () to be structured and a photoactivatable resist layer are disposed on the first side () of the carrier ply (). On exposure of the resist layer through the decorative ply (), the decorative ply () serves as an exposure mask. The at least one layer () to be structured and the resist layer are structured in register to one another by means of structuring operations synchronized with one another.