The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2014
Filed:
Oct. 10, 2006
Applicants:
Kin F. Chan, San Jose, CA (US);
Basil M. Hantash, East Palo Alto, CA (US);
G. Scott Herron, La Honda, CA (US);
Vikramaditya P. Bedi, Redwood City, CA (US);
Inventors:
Kin F. Chan, San Jose, CA (US);
Basil M. Hantash, East Palo Alto, CA (US);
G. Scott Herron, La Honda, CA (US);
Vikramaditya P. Bedi, Redwood City, CA (US);
Assignee:
Reliant Technologies, LLC, Hayward, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 18/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
Subjects treated with nonablative fractional photothermolysis (FP) have an intact stratum corneum, but can have microscopic lesions and vacuole formation within the epidermis. The vacuoles thus formed can trap dermal material and extrude it through the epidermis. Thus, FP can be used for the treatment of recalcitrant melasma, solar elastosis, and tattoos.