The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 01, 2014

Filed:

Nov. 01, 2010
Applicant:

Paulo E. X. Silveira, Boulder, CO (US);

Inventor:

Paulo E. X. Silveira, Boulder, CO (US);

Assignee:

OmniVision Technologies, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 5/225 (2006.01); G02F 1/133 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method for providing an optical device with a variable extended depth-of-field (EDOF). The optical device includes an optically transparent liquid crystal layer, an optically transparent phase mask, optically aligned with the liquid crystal layer and separated therefrom by an optically transparent substrate, an optically transparent index-matching layer, disposed adjacent to one surface of the phase mask, and having a refractive index substantially matching that of the phase mask; and a pair of electrodes for generating an electric field acting on said liquid crystal layer to change the depth of field of the imaging system in proportion to the amplitude of a signal applied to the electrodes.


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