The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2014
Filed:
Mar. 22, 2010
Kensaku Maeda, Kanagawa, JP;
Kaoru Koike, Kumamoto, JP;
Tohru Sasaki, Kumamoto, JP;
Tetsuya Tatsumi, Kanagawa, JP;
Kensaku Maeda, Kanagawa, JP;
Kaoru Koike, Kumamoto, JP;
Tohru Sasaki, Kumamoto, JP;
Tetsuya Tatsumi, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A fabrication method of an anti-reflection structure includes the steps of: forming a resin film having micro-particles dispersed therein on a surface of a substrate; forming a protrusion dummy pattern on the resin film by etching the resin film using the micro-particles in the resin film as a mask while gradually etching the micro-particles; and forming a protrusion pattern on the surface of the substrate by etching back the surface of the substrate together with the resin film having the protrusion dummy pattern formed thereon, and transferring a surface shape of the protrusion dummy pattern formed on a surface of the resin film to the surface of the substrate.