The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2014
Filed:
Oct. 02, 2006
Emily R. Parker, Goleta, CA (US);
Brian J. Thibeault, Santa Barbara, CA (US);
Marco F. Aimi, Menands, NY (US);
Masa P. Rao, Santa Barbara, CA (US);
Noel C. Macdonald, Santa Barbara, CA (US);
Emily R. Parker, Goleta, CA (US);
Brian J. Thibeault, Santa Barbara, CA (US);
Marco F. Aimi, Menands, NY (US);
Masa P. Rao, Santa Barbara, CA (US);
Noel C. MacDonald, Santa Barbara, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
Monocyclic chlorine based inductively coupled plasma deep etching processes for the rapid micromachining of titanium substrates and titanium devices so produced are disclosed. The method parameters are adjustable to simultaneously vary etch rate, mask selectivity, and surface roughness and can be applied to titanium substrates having a wide variety of thicknesses to produce high aspect ratio features, smooth sidewalls, and smooth surfaces. The titanium microdevices so produced exhibit beneficially high fracture toughness, biocompatibility and are robust and able to withstand harsh environments making them useful in a wide variety of applications including microelectronics, micromechanical devices, MEMS, and biological devices that may be used in vivo.