The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 01, 2014

Filed:

Jul. 23, 2012
Applicants:

Jun-hee Lee, Incheon, KR;

Jeong-hoon Lee, Gumi-si, KR;

Inventors:

Jun-Hee Lee, Incheon, KR;

Jeong-Hoon Lee, Gumi-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed herein is a method of fabricating a cliché capable of preventing a printing roller from touching a bottom surface of the cliché. The method of fabricating the cliché includes forming a mask thin film pattern having a multilayer structure and a photoresist pattern on a base substrate, forming a resistant reinforcement inducing layer to cover the photoresist pattern, thereby transforming the photoresist pattern into a resistant reinforced photoresist pattern, and forming groove patterns having different depths from each other by etching the base substrate using the resistant reinforced photoresist pattern and the mask thin film pattern having the multilayer structure as masks.


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