The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2014
Filed:
Jan. 03, 2008
Jeffrey A. Bowers, Kirkland, WA (US);
Kenneth G. Caldeira, Campbell, CA (US);
Alistair K. Chan, Stillwater, MN (US);
William H. Gates, Iii, Redmond, WA (US);
Roderick A. Hyde, Redmond, WA (US);
Muriel Y. Ishikawa, Livermore, CA (US);
Jordin T. Kare, Seattle, WA (US);
John Latham, Boulder, CO (US);
Nathan P. Myhrvold, Medina, WA (US);
Stephen H. Salter, Edinburgh, GB;
Clarence T. Tegreene, Bellevue, WA (US);
Willard H. Wattenburg, Walnut Creek, CA (US);
Lowell L. Wood, Jr., Bellevue, WA (US);
Jeffrey A. Bowers, Kirkland, WA (US);
Kenneth G. Caldeira, Campbell, CA (US);
Alistair K. Chan, Stillwater, MN (US);
William H. Gates, III, Redmond, WA (US);
Roderick A. Hyde, Redmond, WA (US);
Muriel Y. Ishikawa, Livermore, CA (US);
Jordin T. Kare, Seattle, WA (US);
John Latham, Boulder, CO (US);
Nathan P. Myhrvold, Medina, WA (US);
Stephen H. Salter, Edinburgh, GB;
Clarence T. Tegreene, Bellevue, WA (US);
Willard H. Wattenburg, Walnut Creek, CA (US);
Lowell L. Wood, Jr., Bellevue, WA (US);
Abstract
A method is generally described which includes environmental alteration. The method includes determining a placement of at least one vessel capable of moving water to lower depths in the water via wave induced downwelling. The method also includes placing the at least one vessel in the determined placement. Further, the method includes generating movement of the water adjacent the surface of the water in response to the placing.