The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2014
Filed:
Aug. 06, 2012
Mitsuaki Igeta, Kawasaki, JP;
Masahiro Sueda, Kawasaki, JP;
Rikio Takase, Kawasaki, JP;
Akihiro Usujima, Kawasaki, JP;
Mitsuaki Igeta, Kawasaki, JP;
Masahiro Sueda, Kawasaki, JP;
Rikio Takase, Kawasaki, JP;
Akihiro Usujima, Kawasaki, JP;
Fujitsu Semiconductor Limited, Yokohama, JP;
Abstract
A patterning method includes defining, in the case of an electric current which exceeds an allowable limit flowing between first conduction type well regions arranged in a semiconductor substrate, a first pattern between the first conduction type well regions; defining a second pattern by removing, in the case of a first region in which arrangement is inhibited being in the first pattern, the first region from the first pattern; defining a third pattern by removing, in the case of a second region which exceeds a fabrication limit being in the second pattern, the second region from the second pattern; and using the third pattern as a dummy active region in a second conduction type well region arranged in the semiconductor substrate.