The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2014
Filed:
Dec. 02, 2010
Martin S. Maltz, Rochester, NY (US);
Zhigang Fan, Webster, NY (US);
Reiner Eschbach, Webster, NY (US);
Judith Stinehour, Rochester, NY (US);
Martin S. Maltz, Rochester, NY (US);
Zhigang Fan, Webster, NY (US);
Reiner Eschbach, Webster, NY (US);
Judith Stinehour, Rochester, NY (US);
Xerox Corporation, Norwalk, CT (US);
Abstract
A method and system for creating guilloché base pattern with two-dimensional periodicity in a plurality of replicate patterns is shown wherein the creating can be assessed in real-time for pattern acceptability by a user. A base pattern is set on an imaging device in vector space relative to a set of predetermined pattern nodes. The base pattern is modulated via a user interface by adjusting positions of the pattern known for selectively controlling curve shapes of the pattern. A guilloché mark is illustrated by display on the imaging device of the adjusted base pattern and a compilation of associated replicate patterns for user assessment of the mark.