The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2014
Filed:
Jun. 12, 2009
Akira Kobayashi, Yokohami, JP;
Kouji Yamada, Yokohama, JP;
Hideo Kurashima, Yokohama, JP;
Tsunehisa Namiki, Yokohama, JP;
Takeshi Aihara, Yokohama, JP;
Yasunori Onozawa, Yokohama, JP;
Akira Kobayashi, Yokohami, JP;
Kouji Yamada, Yokohama, JP;
Hideo Kurashima, Yokohama, JP;
Tsunehisa Namiki, Yokohama, JP;
Takeshi Aihara, Yokohama, JP;
Yasunori Onozawa, Yokohama, JP;
Toyo Seikan Kaisha, Ltd., Tokyo, JP;
Abstract
A microwave plasma processing device includes a fixing device for fixing a substrate as a processing target on a central axis in a plasma processing chamber, a exhausting device for depressurizing an inside and outside of the substrate, a metal processing gas supply member which is present in the substrate and forms a reentrant cylindrical resonating system along with the plasma processing chamber, and a microwave introducing device for introducing a microwave into the plasma processing chamber to perform processing. A microwave sealing member is provided at a substrate-holding portion of the fixing device, and a connection position of the microwave introducing device is located at a node of an electric field intensity distribution formed on the processing gas supply member by introducing the microwave.