The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2014
Filed:
Nov. 11, 2009
Atsushi Ryokawa, Ube, JP;
Shuhei Yamada, Ube, JP;
Atsushi Ryokawa, Ube, JP;
Shuhei Yamada, Ube, JP;
Central Glass Company, Limited, Ube-shi, JP;
Abstract
Disclosed is a method of producing a hafnium amide complex represented by general formula: Hf(NRR), characterized by comprising: carrying out a reduced-pressure distillation after a lithium alkylamide represented by general formula: Li(NRR) is added to and allowed to react with a tertiary hafnium alkoxide complex represented by general formula: Hf[O(CRRR)]. (In the formulas, R, Rand Rindependently represent either a phenyl group, a benzyl group, or a primary, secondary or tertiary alkyl group having a carbon number 1-6; and Rand Rindependently represent either a methyl group or an ethyl group; however, a case where all of R, Rand Rare methyl groups, and a case where one of R, Rand Ris an ethyl group and the other two are methyl groups are excluded.)