The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2014
Filed:
Jul. 27, 2010
John Traverse, Roselle Park, NJ (US);
William M. Leong, Westfield, NJ (US);
Steven P. Miller, Monroe Township, NJ (US);
Jennifer Albaneze-walker, Westfield, NJ (US);
Thomas J. Hunter, Middleton, WI (US);
Lijun Wang, Dayton, NJ (US);
Hongbiao Liao, Bridgewater, NJ (US);
Ashok Arasappan, Bridgewater, NJ (US);
Scott T. Trzaska, Raritan, NJ (US);
Randi M. Smith, Burlingame, CA (US);
Azzeddine Lekhal, Highland Park, NJ (US);
Stephane L. Bogen, Somerset, NJ (US);
Jianshe Kong, Franklin Park, NJ (US);
Frank Bennett, Cranford, NJ (US);
F. George Njoroge, Carmel, IN (US);
Marc Poirier, Stewartsville, NJ (US);
Shen-chun Kuo, Union, NJ (US);
Yonggang Chen, Westfield, NJ (US);
Kenneth S. Matthews, San Francisco, CA (US);
Patrice Demonchaux, Mitterrand, FR;
Amadeo Ferreira, Maiaux, FR;
John Traverse, Roselle Park, NJ (US);
William M. Leong, Westfield, NJ (US);
Steven P. Miller, Monroe Township, NJ (US);
Jennifer Albaneze-Walker, Westfield, NJ (US);
Thomas J. Hunter, Middleton, WI (US);
Lijun Wang, Dayton, NJ (US);
Hongbiao Liao, Bridgewater, NJ (US);
Ashok Arasappan, Bridgewater, NJ (US);
Scott T. Trzaska, Raritan, NJ (US);
Randi M. Smith, Burlingame, CA (US);
Azzeddine Lekhal, Highland Park, NJ (US);
Stephane L. Bogen, Somerset, NJ (US);
Jianshe Kong, Franklin Park, NJ (US);
Frank Bennett, Cranford, NJ (US);
F. George Njoroge, Carmel, IN (US);
Marc Poirier, Stewartsville, NJ (US);
Shen-Chun Kuo, Union, NJ (US);
Yonggang Chen, Westfield, NJ (US);
Kenneth S. Matthews, San Francisco, CA (US);
Patrice Demonchaux, Mitterrand, FR;
Amadeo Ferreira, Maiaux, FR;
Merck Sharp & Dohme Corp., Rahway, NJ (US);
Abstract
Processes useful for the preparation of a Compound of Formula I: Formula (I). Intermediates useful for the preparation of the compound of Formula I, and processes useful for preparing said intermediates are disclosed.