The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 25, 2014

Filed:

Jan. 12, 2011
Applicants:

Toshihiko Murai, Tokyo, JP;

Yoshie Makabe, Tokyo, JP;

Shohei Fujita, Tokyo, JP;

Inventors:

Toshihiko Murai, Tokyo, JP;

Yoshie Makabe, Tokyo, JP;

Shohei Fujita, Tokyo, JP;

Assignee:

Adeka Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07D 221/06 (2006.01); C07D 311/78 (2006.01); C07D 413/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed are a novel sulfonic acid derivative compound and a novel naphthalic acid derivative compound with high solubility in organic solvents, good photosensitivity, and suitability as a photoacid generator and a polymerization initiator. The sulfonic acid derivative compound is represented by the formula (I) (wherein R, R, R, and Rrepresent a hydrogen atom; any one of Rand Rrepresents an alkoxy group having a carbon number of 4 to 18 which may be substituted with an alicyclic hydrocarbon group, a heterocyclic group, or a halogen atom and which may have a branch, or the like; and Rrepresents an aliphatic hydrocarbon group having a carbon number of 1 to 18 which may be substituted with a halogen atom and/or an alkylthio group, or the like).


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