The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2014
Filed:
Nov. 11, 2008
Jeon Kyu Lee, Gyeonggi-do, KR;
Jeon Kyu Lee, Gyeonggi-do, KR;
SK hynix Inc., Icheon-si, KR;
Abstract
Disclosed is a method for forming patterns of a semiconductor device, which includes: arranging dense patterns to be transferred in a dense pattern region of a wafer; inserting a first dummy pattern for restricting pattern distortion of the dense patterns in an outside of the array of the dense patterns; inserting a first assist feature for restricting pattern distortion of the first dummy pattern in an inside of the first dummy pattern; inserting an array of second assist features for additionally restricting pattern distortion of the first dummy pattern in an outside of the first dummy pattern, thereto designing a pattern layout to be transferred onto the wafer; and forming an array of the dense patterns and the first dummy patterns by transferring the pattern layout onto the wafer through an exposure.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile