The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2014
Filed:
May. 26, 2010
Hauke Pohlmann, Hamburg, DE;
Ronald Dekker, Valkenswaard, NL;
Joerg Mueller, Hamburg, DE;
Martin Duemling, Hamburg, DE;
Hauke Pohlmann, Hamburg, DE;
Ronald Dekker, Valkenswaard, NL;
Joerg Mueller, Hamburg, DE;
Martin Duemling, Hamburg, DE;
NXP, B.V., Eindhoven, NL;
Abstract
A method of manufacturing an electronic device that comprises a microelectromechanical (MEMS) element, the method comprising the steps of: providing a material layer () on a first side of a substrate (); providing a trench () in the material later (); etching material from the trench () such as to also etch the substrate () from the first side of the substrate (); grinding the substrate () from a second side of the substrate to expose the trench (); and using the exposed trench () as an etch hole. The exposed trench () is used as an etch hole for releasing a portion of the material layer (), for example a beam resonator (), from the substrate (). An input electrode (), an output electrode (), and a top electrode () are provided.