The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Apr. 23, 2012
Jian Liu, Sunnyvale, CA (US);
Huan Huang, Fremont, CA (US);
Jian Liu, Sunnyvale, CA (US);
Huan Huang, Fremont, CA (US);
Other;
Abstract
Methods and systems for real time feedback and control of near-field material processing are disclosed, including generating electromagnetic radiation from a USP laser coupled to a central processing unit; coupling the electromagnetic radiation to an acousto-optic modulator; coupling the electromagnetic radiation to a beam delivery system; coupling the electromagnetic radiation to a beam delivery fiber; using the electromagnetic radiation to generate a plasma on a target mounted to an adjustable stage coupled to the central processing unit; coupling the electromagnetic radiation from the plasma to a plasma spectrum collection system; coupling the electromagnetic radiation to a spectrum analysis unit; coupling the electromagnetic radiation to a detector; and coupling the detector to the central processing unit; wherein the central processing unit uses the output from the detector as feedback in making adjustments to the USP laser and the adjustable stage. Other embodiments are described and claimed.