The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Mar. 31, 2011
Applicants:
Sung Min Ahn, Seoul, KR;
Ho Seok Choi, Suwon-si, KR;
Sang Don Jang, Suwon-si, KR;
Inventors:
Assignee:
Samsung Electronics Co., Ltd., Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01); G03B 27/32 (2006.01); G03B 27/42 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract
Example embodiments are directed to a maskless exposure device and an alignment method. The alignment method performs an overlay of each layer of a plurality of layers on a substrate using a virtual mask in a maskless exposure technique. The maskless exposure device and the alignment method use a virtual mask instead of a physical mask used in a conventional mask exposure, a virtual target mark instead of an alignment mark used in the conventional mask exposure, and perform an overlay per layer, such that the deposition exposure can be achieved in the maskless exposure.