The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Jul. 23, 2008
Henry A. Hill, Tucson, AZ (US);
David W. Gardner, Colorado Springs, CO (US);
Henry A. Hill, Tucson, AZ (US);
David W. Gardner, Colorado Springs, CO (US);
Flir Systems, Inc., Wilsonville, OR (US);
Abstract
An alignment metrology and resolution measurement system concurrently determines the alignment of an imaging array in six degrees of freedom relative to an external reference frame, and further determines the resolution of the imaging array. To achieve this, an image of at least three mask patterns is projected on the imaging array. First and second positions of the imaging array relative to first and second coordinate axis of the reference frame is obtained using pixel positions of the images along the first and second axis. A first rotational position of the imaging array about a third coordinate axis is obtained using pixel positions of the images along the first and second axes. The third position and the second and third rotational positions of the imaging array about the first and second coordinate axis are determined using feature widths of focus images of the patterns and distances between the mask patterns.