The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Mar. 19, 2010
Beom Soo Park, San Jose, CA (US);
Hong Soon Kim, San Jose, CA (US);
Soo Young Choi, Fremont, CA (US);
James Hoffman, San Jose, CA (US);
Suhail Anwar, San Jose, CA (US);
John M. White, Hayward, CA (US);
Beom Soo Park, San Jose, CA (US);
Hong Soon Kim, San Jose, CA (US);
Soo Young Choi, Fremont, CA (US);
James Hoffman, San Jose, CA (US);
Suhail Anwar, San Jose, CA (US);
John M. White, Hayward, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Malfunction of a component within an RF-powered plasma chamber is detected by observing an operating condition of the plasma chamber and detecting when the operating condition deviates from a previously observed range bounded by lower and upper limits. The lower and upper limits are determined by observing the minimum and maximum values of that operating condition during the processing of workpieces throughout one or more plasma chamber cleaning cycles immediately preceding the most recent cleaning of the plasma chamber.