The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
May. 10, 2012
Chin Yim Poon, Santa Clara, CA (US);
Yew Ming Chiong, San Jose, CA (US);
Paul C. Dorsey, Los Altos, CA (US);
Tatsuru Tanaka, Campbell, CA (US);
Chin Yim Poon, Santa Clara, CA (US);
Yew Ming Chiong, San Jose, CA (US);
Paul C. Dorsey, Los Altos, CA (US);
Tatsuru Tanaka, Campbell, CA (US);
WD Media, LLC, San Jose, CA (US);
Abstract
Systems and methods for uniformly implanting materials on substrates using directed magnetic fields are provided. One such system includes a chamber configured to receive a preselected material and to enclose a first substrate, first and second rotating assemblies configured to facilitate an implantation of the preselected material onto first and second surfaces of the first substrate and including first and second rotating magnet sub-assemblies configured to direct magnetic fields onto the first and second surfaces, and an RF energizer configured to apply RF energy to the first substrate, where the first magnetic field and the second magnetic field combine to form a resultant magnetic field that is substantially parallel along the first surface, and where the implantation of the preselected material onto the first substrate occurs based on a combination of the RF energy and the resultant magnetic field.