The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
May. 22, 2012
Applicants:
Vladimir V. Makarov, Fremont, CA (US);
Sergey Macheret, Palmdale, CA (US);
Inventors:
Vladimir V. Makarov, Fremont, CA (US);
Sergey Macheret, Palmdale, CA (US);
Assignee:
Tiza Lab, L.L.C., Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/08 (2006.01); H01J 49/40 (2006.01); A61L 2/14 (2006.01); H01J 49/16 (2006.01); H01J 27/26 (2006.01); H01J 37/32 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32018 (2013.01); H01J 37/3171 (2013.01); H01J 27/26 (2013.01); H01J 49/167 (2013.01);
Abstract
The present invention provides a method of obtaining a bright source of ions with narrow energy spread for focused ion beam applications using micro plasmas. As a preferred embodiment, a high pressure microplasma source operating in a normal glow discharge regime is used to produce a cold bright focused beam of Xeand/or Xeions having ion temperature of the order of 0.5-1 eV and a current density on the order of 0.1-1 A/cmor higher.