The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Apr. 03, 2012
Kiyotada Katoh, Shizuoka, JP;
Yasutada Shitara, Shizuoka, JP;
Minoru Masuda, Shizuoka, JP;
Yoshihiro Norikane, Kanagawa, JP;
Kenta Kenjoh, Shizuoka, JP;
Satoshi Takahashi, Shizuoka, JP;
Kiyotada Katoh, Shizuoka, JP;
Yasutada Shitara, Shizuoka, JP;
Minoru Masuda, Shizuoka, JP;
Yoshihiro Norikane, Kanagawa, JP;
Kenta Kenjoh, Shizuoka, JP;
Satoshi Takahashi, Shizuoka, JP;
Ricoh Company, Ltd., Tokyo, JP;
Abstract
The particulate material production method includes vibrating a particulate material composition liquid in a liquid column resonance chamber having at least one nozzle to form a standing wave in the particulate material composition liquid caused by liquid column resonance, so that droplets of the particulate material composition liquid are ejected in a droplet ejection direction from the nozzle so as to fly in a space in a flight direction; feeding a gas in a direction substantially perpendicular to the droplet ejection direction to change the flight direction of the ejected droplets; and solidifying the droplets in the space to produce a particulate material. The particulate material composition liquid includes at least a solvent and a component of the particulate material dissolved or dispersed in the solvent, and the nozzle is located at a location corresponding to an anitnode of the standing wave.