The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8673408 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 18, 2014

Filed:

May. 27, 2011
Applicant:

Shunichi Yorozuya, Utsunomiya, JP;

Inventor:

Shunichi Yorozuya, Utsunomiya, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/00 (2006.01); B05D 3/14 (2006.01); H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plasma nozzle supplies a plasmatized electric discharge gas, and a first supply section in a flow regulator which is interposed between the plasma nozzle and a base member supplies a first liquid-phase raw material. A second supply section which is separate from the first supply section supplies a second liquid-phase raw material. The first liquid-phase raw material which is activated by a plasmatized electric discharge gas and deposited on the base member while in a liquid phase is caused to interact with the second liquid-phase raw material which is activated by the plasmatized electric discharge gas, and solidified into a film on the base member.


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Yorozuya, Shunichi. (2014). Plasma film deposition method (U.S. Patent No. 8673408). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8673408

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